Book Info
Thin film technology has been pivotal to the semiconductor industry since the 1970s, evolving alongside advancements in materials and technology. Even today, thin films are equally used in the fields of electronics, energy, and medicine. In the future, thin film will lead the way for flexible and wearable technologies. This book offers a comprehensive guide to essential silicon thin film characterization techniques, drawn from the author’s hands-on laboratory experience. Each chapter provides a detailed exploration, from measuring thickness to analyzing crystallinity, surface morphology, material composition, optical response, and electrical properties. With theoretical insights, equations, experimental data, graphical analysis, and practical examples, readers will gain the expertise needed to perform precise data interpretation. Furthermore, a few problems are provided for practice at the end of each chapter. Ideal for beginners and experts alike, this book is an invaluable resource for those working in materials science, semiconductor applications, and multidisciplinary scientific fields.
M Abul Hossion
M Abul Hossion received his bachelor’s and master’s in physics from the University of Chittagong, Bangladesh in 2008 and 2009 respectively. In May 2017, he earned his Ph.D. from the Department of Electrical and Electronic Engineering, University of Dhaka, Bangladesh. His doctoral research was conducted at the Department of EE, IIT Bombay, India on the fabrication of optoelectronic device using HWCVD. Since then, he has been teaching physics in universities. As of today, he has published more than 20 articles in journals from renowned publishers. At present, Dr. Hossion is working on perovskite material synthesis for optoelectronic applications and the study of PV module degradation.
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